MRS-6 Magnification Reference Standard 1,500x - 1,000,000x
This is the next generation, NIST and NPL (NIST counterpart in the U.K.) Traceable, Magnification Reference Standard & Stage Micrometer. For Instrument Calibration from 1,500x – 1,000,000x (80nm min. pitch).
- Electron Microscopy: SEM and FIB/SEM (secondary & backscattered electrons), TEM (for use with a bulk holder) the MRS-6 is conveniently sized at 3.2 x 3.2 x 0.5mm.
- Scanning Microscopies and Profilometry: STM, AFM, stylus and optical, etc. The pattern height is approximately 15nm.
- Optical Microscopy: reflected, bright/dark field, differential contrast, and confocal.
- Chemical Mapping: EDS, WDS, Micro/Macro XRF, XPS, Auger, and others. The pattern is fabricated using 15nm chromium over single crystal silicon.
- Resolution Testing: With a series of 2 bar targets (similar to the USAF 1953 patterns) ranging in size from 80nm to 3µm.
- Linearity Testing: With a 1µm² pitch over 40 x 40µm.
- A Standard Ahead of Its Time: The MRS-6 represents a challenging next step. The nanotechnology sized patterns will be a good test of your imaging systems.
- Advanced optical microscopes now have submicrometer test patterns to measure resolution and linearity.
- Scanning electron microscopes have a pattern that will show significant differences between backscattered and secondary electron type I and type II images. Imaging the pattern will also tax their low accelerating voltage capabilities.
- Scanning probe microscopes have a pattern that is closely sized to the finest cantilever tips challenging their resolution ability.
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Art#614-80 MRS-6NT Reference Standard, X-Y, Not Traceable, without Protective Retainer, Unmounted
Art# 614-81 MRS-6XY Reference Standard, X-Y, Traceable, without Protective Retainer, Unmounted